Crystalline silicon wafers

The Kanthal program features Fibrothal® heating elements used in the production of crystalline silicon wafers for solar and semiconductor applications.

Kanthal Fibrothal® heating elements cover a wide range of processes, such as:

  • Fast-cooling processes
  • Oxidation processes
  • Nitriding processes

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Fibrothal® heating elements

Fibrothal® heating elements

MRL technology now continues through Kanthal’s Fibrothal® heating elements, supporting semiconductor processes across a temperature range of 300 to 1,350°C (572 to 2,462°F). These heavy and light-gauge elements are compatible with both horizontal and vertical furnace designs across different brands and configurations.

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