Kanthal's range of Fibrothal® diffusion cassettes plays a versatile role in semiconductor manufacturing, fitting seamlessly into both Atmospheric and Low-Pressure Chemical Vapor Deposition (LPCVD) processes. These cassettes can yield precise linear temperature uniformity for diffusion of dopants, annealing, or oxidation, and provide reliable, repeatable results. Fibrothal® diffusion cassettes enhance the efficiency and precision of their processes, ultimately contributing to the production of high-quality semiconductor devices.

How Atmospheric Processes Shape High-Performance Semiconductor Devices

Atmospheric processes play a crucial role in the semiconductor industry, enabling the fabrication of high-performance devices. These processes serve diverse purposes, including the controlled diffusion of dopants into materials and the optimization of crystal structures for improved device reliability and overall quality.

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LPCVD: Precision Engineering for Advanced Semiconductor Devices

Widely embraced in the semiconductor industry, LPCVD finds applications in depositing materials like silicon nitride, silicon dioxide, and polysilicon. Its controlled nature and ability to achieve precise thickness and uniformity make LPCVD a cornerstone in the creation of advanced semiconductor devices. Operating at lower pressures compared to other chemical vapor deposition methods, LPCVD ensures meticulous control over film properties.

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